The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. ex. Some numerals are expressed as "XNUMX".
Copyrights notice
The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. Copyrights notice
Konsep reka bentuk dan latar belakang simulator proses semikonduktor 3 dimensi dibentangkan. Ia direka bentuk untuk menjadi asas pembangunan model proses semikonduktor. Bahasa input direka bentuk untuk merealisasikan jujukan simulasi kawalan secara fleksibel, dan program penterjemahnya direka bentuk untuk menerima perisian luaran untuk dikawal dan disepadukan ke dalam sistem. Untuk merealisasikan pertukaran data antara simulator proses dan perisian lain, format fail data yang menerangkan sendiri direka bentuk dan perpustakaan program yang berkaitan dibangunkan. Kelas C++ untuk menyelesaikan persamaan pembezaan separa jenis drift-difusi dalam ruang tiga dimensi dibangunkan.
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Salinan
Tetsunori WADA, Norihiko KOTANI, "Design and Development of 3-Dimensional Process Simulator" in IEICE TRANSACTIONS on Electronics,
vol. E82-C, no. 6, pp. 839-847, June 1999, doi: .
Abstract: Design concepts and backgrounds of a 3-dimensional semiconductor process simulator are presented. It is designed to become a basis of developing semiconductor process models. An input language is designed to realize flexibly controlling simulation sequence, and its interpreter program is designed to accept external software to be controlled and to be integrated into a system. To realize data-exchanges between the process simulator and other software, a self-describing data-file format is designed and related program libraries are developed. A C++ class for solving drift-diffusion type partial-differential-equation in a three-dimensional space is developed.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e82-c_6_839/_p
Salinan
@ARTICLE{e82-c_6_839,
author={Tetsunori WADA, Norihiko KOTANI, },
journal={IEICE TRANSACTIONS on Electronics},
title={Design and Development of 3-Dimensional Process Simulator},
year={1999},
volume={E82-C},
number={6},
pages={839-847},
abstract={Design concepts and backgrounds of a 3-dimensional semiconductor process simulator are presented. It is designed to become a basis of developing semiconductor process models. An input language is designed to realize flexibly controlling simulation sequence, and its interpreter program is designed to accept external software to be controlled and to be integrated into a system. To realize data-exchanges between the process simulator and other software, a self-describing data-file format is designed and related program libraries are developed. A C++ class for solving drift-diffusion type partial-differential-equation in a three-dimensional space is developed.},
keywords={},
doi={},
ISSN={},
month={June},}
Salinan
TY - JOUR
TI - Design and Development of 3-Dimensional Process Simulator
T2 - IEICE TRANSACTIONS on Electronics
SP - 839
EP - 847
AU - Tetsunori WADA
AU - Norihiko KOTANI
PY - 1999
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E82-C
IS - 6
JA - IEICE TRANSACTIONS on Electronics
Y1 - June 1999
AB - Design concepts and backgrounds of a 3-dimensional semiconductor process simulator are presented. It is designed to become a basis of developing semiconductor process models. An input language is designed to realize flexibly controlling simulation sequence, and its interpreter program is designed to accept external software to be controlled and to be integrated into a system. To realize data-exchanges between the process simulator and other software, a self-describing data-file format is designed and related program libraries are developed. A C++ class for solving drift-diffusion type partial-differential-equation in a three-dimensional space is developed.
ER -