The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. ex. Some numerals are expressed as "XNUMX".
Copyrights notice
The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. Copyrights notice
Litografi unjuran aksara (CP) digunakan untuk litografi tanpa topeng dan berpotensi untuk pembuatan topeng foto masa hadapan kerana ia boleh menayangkan IC dengan lebih pantas daripada unjuran rasuk titik atau unjuran rasuk berbentuk berubah-ubah (VSB). Dalam makalah ini, kami mula-mula membentangkan metodologi pembangunan set topeng unjuran untuk sistem sel berbilang lajur (MCC), di mana sel lajur boleh menayangkan corak selari dengan litografi CP dan VSB. Seterusnya, kami mempersembahkan model INLP (integer nonlinear programming) serta model ILP (integer linear programming) untuk mengoptimumkan set topeng CP bagi sistem unjuran MCC supaya masa unjuran dikurangkan. Keputusan percubaan menunjukkan bahawa pengoptimuman kami telah mencapai 33.4% kurang masa unjuran dalam kes terbaik daripada pendekatan pembangunan topeng CP naif. Keputusan eksperimen menunjukkan bahawa kaedah pengoptimuman set topeng CP kami telah meningkatkan objek corak sel secara hampir pada topeng CP dan telah mengurangkan unjuran VSB supaya ia telah mencapai daya tampung unjuran yang lebih tinggi daripada hanya menyelaraskan dua sel lajur dengan topeng CP konvensional.
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Salinan
Makoto SUGIHARA, Yusuke MATSUNAGA, Kazuaki MURAKAMI, "Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems" in IEICE TRANSACTIONS on Fundamentals,
vol. E91-A, no. 12, pp. 3451-3460, December 2008, doi: 10.1093/ietfec/e91-a.12.3451.
Abstract: Character projection (CP) lithography is utilized for maskless lithography and is a potential for the future photomask manufacture because it can project ICs much faster than point beam projection or variable-shaped beam (VSB) projection. In this paper, we first present a projection mask set development methodology for multi-column-cell (MCC) systems, in which column-cells can project patterns in parallel with the CP and VSB lithographies. Next, we present an INLP (integer nonlinear programming) model as well as an ILP (integer linear programming) model for optimizing a CP mask set of an MCC projection system so that projection time is reduced. The experimental results show that our optimization has achieved 33.4% less projection time in the best case than a naive CP mask development approach. The experimental results indicate that our CP mask set optimization method has virtually increased cell pattern objects on CP masks and has decreased VSB projection so that it has achieved higher projection throughput than just parallelizing two column-cells with conventional CP masks.
URL: https://global.ieice.org/en_transactions/fundamentals/10.1093/ietfec/e91-a.12.3451/_p
Salinan
@ARTICLE{e91-a_12_3451,
author={Makoto SUGIHARA, Yusuke MATSUNAGA, Kazuaki MURAKAMI, },
journal={IEICE TRANSACTIONS on Fundamentals},
title={Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems},
year={2008},
volume={E91-A},
number={12},
pages={3451-3460},
abstract={Character projection (CP) lithography is utilized for maskless lithography and is a potential for the future photomask manufacture because it can project ICs much faster than point beam projection or variable-shaped beam (VSB) projection. In this paper, we first present a projection mask set development methodology for multi-column-cell (MCC) systems, in which column-cells can project patterns in parallel with the CP and VSB lithographies. Next, we present an INLP (integer nonlinear programming) model as well as an ILP (integer linear programming) model for optimizing a CP mask set of an MCC projection system so that projection time is reduced. The experimental results show that our optimization has achieved 33.4% less projection time in the best case than a naive CP mask development approach. The experimental results indicate that our CP mask set optimization method has virtually increased cell pattern objects on CP masks and has decreased VSB projection so that it has achieved higher projection throughput than just parallelizing two column-cells with conventional CP masks.},
keywords={},
doi={10.1093/ietfec/e91-a.12.3451},
ISSN={1745-1337},
month={December},}
Salinan
TY - JOUR
TI - Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems
T2 - IEICE TRANSACTIONS on Fundamentals
SP - 3451
EP - 3460
AU - Makoto SUGIHARA
AU - Yusuke MATSUNAGA
AU - Kazuaki MURAKAMI
PY - 2008
DO - 10.1093/ietfec/e91-a.12.3451
JO - IEICE TRANSACTIONS on Fundamentals
SN - 1745-1337
VL - E91-A
IS - 12
JA - IEICE TRANSACTIONS on Fundamentals
Y1 - December 2008
AB - Character projection (CP) lithography is utilized for maskless lithography and is a potential for the future photomask manufacture because it can project ICs much faster than point beam projection or variable-shaped beam (VSB) projection. In this paper, we first present a projection mask set development methodology for multi-column-cell (MCC) systems, in which column-cells can project patterns in parallel with the CP and VSB lithographies. Next, we present an INLP (integer nonlinear programming) model as well as an ILP (integer linear programming) model for optimizing a CP mask set of an MCC projection system so that projection time is reduced. The experimental results show that our optimization has achieved 33.4% less projection time in the best case than a naive CP mask development approach. The experimental results indicate that our CP mask set optimization method has virtually increased cell pattern objects on CP masks and has decreased VSB projection so that it has achieved higher projection throughput than just parallelizing two column-cells with conventional CP masks.
ER -